| Exhibitor name |
広東華昇ナノテクノロジー株式会社
Guangdong Huasheng Nanotechnology Co..Ltd
|
| Address |
〒523-000 OVERSEAS(海外) 広東省東莞市大山镇速路36号
No. 36, Sulu Road, Dashan Town, Dongguan City, Guangdong Province
|
| Website |
https://www.hsvacuum.com/ |
| Email |
|
| Phone number |
+81-90-7757-5971 |
| PR message |
Huasheng Nanotech showcases three PVD systems: TC800PLUS-F for ta-C coatings (>5000HV, nano-smooth), WCC800 for wear-resistant WCC films, and HiPIMS for dense smooth layers on complex shapes. With high productivity and cost efficiency, we optimize surface treatments for molds, tools, and auto parts. |
| The Main Item |
Next-Generation PVD Coating Equipment |
| The name of Item[1] |
Filtered Arc ta-C Coating System TC800PLUS-F |
| Details[1] |
This Filtered Arc ta-C Coating System TC800PLUS-F is developed to achieve both ultra-smooth surface and ultra-high hardness required by PCB micro drills, optical molds, precision pins and other high-precision components. Equipped with proprietary magnetic filtered arc technology, it thoroughly eliminates droplets, the key challenge of traditional arc ion plating. The deposited ta-C film features hardness over 5000 HV, ultra-low friction coefficient, and excellent wear resistance. By integrating the advantages of ion source and multi-arc technology, it realizes efficient intermediate layer deposition. The modular design enables rapid mass production setup and delivers outstanding cost performance. Key specifications: overall dimension 4950×3400×2600mm, effective coating area Φ650×400mm, rated power 50kW, standard ta-C coating cycle 3-6 hours. It is widely applicable to PCB tools, optical molds, automotive precision parts, medical device components, cutting tools . |
| The name of Item[2] |
High Performance WCC Coating System WCC800 |
| Details[2] |
WCC800 is a specialized PVD solution designed for high-precision manufacturing. It integrates dual-mode intelligent control to ensure stable coating quality and batch consistency, solving common issues such as uneven film thickness and poor adhesion in traditional equipment. Equipped with 1 DC magnetron sputtering source and 3 HiPIMS sources, it generates high ionization for dense film structure and excellent adhesion. The deposited WCC coating features 11–16 GPa hardness, 0.1 dry friction coefficient against steel, and over 40 N critical adhesion load, effectively reducing friction and wear. It supports 100–200℃ low-temperature deposition to prevent substrate thermal deformation. With 350 kg maximum load capacity and ≤±10% film thickness uniformity, it adapts to small precision parts and large complex components. Widely used in automotive powertrain, cutting tools, molds, semiconductors and aerospace, it helps customers improve product performance and extend service life. |
| The name of Item[3] |
Next-generation HiPIMS Coating System GFOUR |
| Details[3] |
This next-generation hybrid coating system integrates the advantages of magnetron sputtering and arc ion plating, tailored for high-precision coating of cutting tools and molds. With proprietary integrated cathode technology, it significantly boosts plasma ionization, completely eliminates droplets in conventional arc coatings, and delivers ultra-smooth film surfaces. Film thickness is precisely controllable from 0.5μm to 30μm, and cutting edge integrity remains intact even at a 3μm passivation value.
The exclusive magnetic field design enhances target utilization, balancing high deposition rate and excellent thickness uniformity. Film-substrate adhesion exceeds 100N, achieving an ideal balance between high hardness and low residual stress.
Key specifications: L4850×W1600×H2400mm, chamber volume 0.76m³, effective coating area Φ500×400mm, max load 300kg. It supports batch coating of 8400 APMT1135 inserts or 2520 D4×50L rod end mills. |
Category of
Exhibit Items |
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OSAKA